New Cleaning steps added

Have been using new pre-deposition cleaning procedure.  First the silica sample, which is already cut and has had an oxide layer grown on it thermally, are placed in a plastic beaker which contains methanol and is then put in an ultrasonic bath for 5 minutes.  This step is to loosen any debris which may be strongly adhered to the surface.  Next it is cleaned in a plasma cleaner for 10 min at 18 W.  Then it is placed in a solution of 1:1:5 hydrogen peroxide, ammonium hydroxide and DI water for 10 minutes at 75 degrees Celsius.  They are then removed and rinsed with DI water and dried with N2 and placed back in the plasma cleaner for 5 minutes at 10 W.  Then the sample is attached to the arm of the stepper motor and lowered into the sphere solution (2400 microliters sphere diffusion and 3600 microliters water which has been sonicated for 10 min) and the Langmuir-Blodgett barriers are advanced for 3 minutes while the sample is stationary.  The stationary step is to allow the spheres to build up a monolayer concentration near the surface of the substrate.  Then the substrate is withdrawn at 5 micrometers per second and while the barriers are advanced at 3 ticks above the slow mark.  A plastic ziplock bag is lowered around the set up to prevent any turbulent air currents from disrupting the deposition or bring contaminants into the solution.  Every 4 minutes the barriers are backed away from the substrate and restarted.  Once the process is complete, the substrate is placed in a sterile container horizontally.  The polystyrene sphere solution is pipetted back into its container and stored.  SEM was to be done today but due to scheduling conflicts was not able to secure a spot.  Looking forward to seeing how the etching from last week turned out.  Nice to finally see some results, promising or not, because at least it will point us in a direction for the next step.